TiO₂薄膜的结构和光学性质的研究

TiO 2 薄膜的结构和光学性质的研究 Structural and Optical Properties of TiO 2 Thin Films 谢强 XIE Qiang 1 2 first-author 王取泉 WANG Qu\|quan 1 2 魏正和 WEI Zheng\|he 1 2 周正国 ZHOU Zheng\|guo 1 2 武汉大学物理科学与技术学院 武汉大学物理科学与技术学院 School of Physics and Technology, Wuhan University School of Physics and Technology, Wuhan University 武汉大学物理科学与技术学院,湖北,武汉,430072 武汉大学物理科学与技术学院,湖北,武汉,430072 以金属钛为靶材 ,用反应射频溅射法制备了TiO2 薄膜 ,并在 6 0 0～ 90 0℃下进行了热处理 .经XRD测量 ,在 6 0 0～ 80 0℃下TiO2 薄膜为锐钛矿和金红石两种结构的混合态 ,在 90 0℃下TiO2 薄膜为纯金红石结构 .研究TiO2薄膜的SEM照片和UV vis透射光谱发现 ,不同的热处理温度会影响TiO2 薄膜中锐钛矿和金红石两种结构的比例 ,从而导致TiO2 薄膜的微观形貌、折射率、禁带宽度等性质的变化 . TiO 2 thin films were prepared by reactive RF sputtering and annealed at 600 to 900℃. The films consist of rutile and anatase structure annealed at 600 to 800℃ and pure rutile structure annealed at 900℃ by X\|ray diffraction （XRD） analysis. According to our research on XRD, the ratio of two structure of TiO 2 films is mainly influenced by anneal temperature and the rutile structure become the main structure as the anneal temperature increasing. And the SEM pictures show that the size of TiO 2 grains in films ranges from 200 nm to 600 nm and increases as the anneal temperature increasing. Refraction index （ n ） and indirect optical absorption band\|gaps （ E g ） of TiO 2 films were caculated according to UV\|vis transmission spectrum. The result shows that the refraction index （ n ） increases from 2.38 to 2.51 and the indirect optical absorption band\|gaps （ E g ） decreases from 3.2 to 3.1 eV as the anneal temperature increasing from 600 to 800℃. TiO2薄膜 结构特性 光学性质 TiO 2 thin film structural properties optical properties O484.41 国家自然科学基金资助项目 （5 98710 3 3 ） 2002-05-01 2021-04-01 5