靶形对溅射薄膜厚度均匀性影响的研究

靶形对溅射薄膜厚度均匀性影响的研究 INVESTIGATION OF IMPROVING THE THICKNESS UNIFORMITY OF THE FILM FORMED BY CATHODE SPUTTERING 张苏淮 1 first-author 魏文忠 1 杨晖 1 武汉大学物理学系 武汉大学物理学系 本文提出了一种提高溅射镀膜膜厚均匀性的方法。通过计算得到对于多晶和非晶材料制成的阴极靶在强电场气体离子轰击下,若在靶中央开孔并适当选取靶与基板的距离,可以明显改善膜厚均匀性和均匀范围。采用10cm×10cm的阴极靶,中央开5cm×5cm的孔,所得薄膜厚度不均匀性小于3%的范围是11cm×11cm. The way of improving the thickness uniformity of the films formed by cathode sputtering is presented in this paper, It is shown from computation that under the bombardment of the ions with strong electic field strength, the thickness uniformity and the homogeneous range, for the cathode target made by multi-crystal or non-crystal material, can be greatly improved and expanded if the square window is holed at the centre of the farget and the distance between the target and the substract is properly selected. In experi- ment, the uniform range with the square size of 11cm×11cm and, the nonuni- formity less than 3% kave been obtained by using the cathod target with the size of 10cm×10cm and the window located at its centre with the size of 5cm ×5cm. 溅射 膜厚均匀性 阴极粑 Q484.4 1992-03-01 2021-04-01 3