Nafion薄膜表面微结构转变

Nafion薄膜表面微结构转变 Surface Microstructure Transformation in Nafion Films 张丽纯 ZHANG Lichun 1 first-author 何春清 HE Chunqing 1 武汉大学物理科学与技术学院 武汉大学物理科学与技术学院 School of Physics and Technology,Wuhan University School of Physics and Technology,Wuhan University 采用旋涂法,以不同表面预处理的硅片为衬底镀上Nafion膜,将硅片上薄膜进行退火处理,得到不同衬底上退火前后的Nafion膜.通过原子力显微镜对薄膜的表面形貌进行了表征和观察,基于慢正电子束的正电子湮没多普勒谱获得薄膜中正电子湮没线性参数S与正电子注入能量E的关系曲线,用接触角测定仪测得不同衬底的Nafion膜表面接触角.研究结果表明,不同预处理的衬底硅片对Nafion膜表面的微结构有影响,热处理引起薄膜中分子链运动,导致退火前后薄膜表面层亲水基的分布发生了转变. In this paper,Nafion films were spin-coated onto silicon wafers which were subjected to different types of surface pretreatments.Nafion membranes were annealed at 150℃for 2hin a vacuum oven.Surface morphologies and contact angles of the prepared Nafion films were measured by an atomic force microscopy（AFM）and a contact angle instrument,respectively.Meanwhile,the Nafion membranes on different substrates were characterized by positron annihilation doppler broadening spectroscopy based on a slow positron beam.Results show that the treatment of substrates has effect on the microstructure of Nafion films,and thermal treatment cause the movement of molecular chain,leading to the rearrangement of hydrophilic groups and hydrophobic segments in Nafion membranes. Nafion膜 粗糙因子 S参数 接触角 微结构 Nafion membrane roughness Sparameter contact angle microstructure 10.14188/j.1671-8836.2014.03.002 O484.4 国家自然科学基金（10975108）;回国留学基金资助项目 2014-03-01 2021-04-01 3 60